Riikka Puurunen

Valokuvaaja: Erkki Pöytäniemi

PuurunenAalto-yliopisto

Riikka Puurunen

Professori (Associate professor), Kemian tekniikan ja metallurgian laitos

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(ks. englanninkielinen kuvaus, https://people.aalto.fi/en/riikka_puurunen)


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Yhteystiedot

Työkäyntiosoite
Kemistintie 1
02150
Espoo
Finland
Työpostiosoite
P.O. Box 16100
00076
AALTO
Finland
Huonenumero
E412
Työsähköpostiosoite
riikka.puurunen at aalto.fi
Twitter
http://twitter.com/@rlpuu

Julkaisut

Vertaisarvioidut tieteelliset artikkelit

Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Kilpi, Lauri; Ylivaara, Oili M.E.; Vaajoki, Antti; Liu, Xuwen; Rontu, Ville; Sintonen, Sakari; Haimi, Eero; Malm, Jari; Bosund, Markus; Tuominen, Marko; Sajavaara, Timo; Lipsanen, Harri; Hannula, Simo Pekka; Puurunen, Riikka L.; Ronkainen, Helena 

2018 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition Growth and mechanical properties

Ylivaara, Oili M E; Kilpi, Lauri; Liu, Xuwen; Sintonen, Sakari; Ali, Saima; Laitinen, Mikko; Julin, Jaakko; Haimi, Eero; Sajavaara, Timo; Lipsanen, Harri; Hannula, Simo Pekka; Ronkainen, Helena; Puurunen, Riikka 

2017 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

Thermal conductivity of amorphous Al2O3/TiO2 nanolaminates deposited by atomic layer deposition

Ali, Saima; Juntunen, Taneli; Sintonen, Sakari; Ylivaara, Oili M E; Puurunen, Riikka; Lipsanen, Harri; Tittonen, Ilkka; Hannula, Simo Pekka 

2016 

NANOTECHNOLOGY 

IOP PUBLISHING LTD 

ISSN: 0957-4484 

Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

Kilpi, Lauri; Ylivaara, Oili M. E.; Vaajoki, Antti; Malm, Jari; Sintonen, Sakari; Tuominen, Marko; Puurunen, Riikka L.; Ronkainen, Helena 

2016 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

Mattinen, Miika; Hämäläinen, Jani; Gao, Feng; Jalkanen, Pasi; Mizohata, Kenichiro; Räisänen, Jyrki; Puurunen, Riikka L.; Ritala, Mikko; Leskelä, Markku 

2016 

LANGMUIR 

AMER CHEMICAL SOC 

ISSN: 0743-7463 

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Berdova, Maria; Ylivaara, Oili M. E.; Rontu, Ville; Törmä, Pekka T.; Puurunen, Riikka; Franssila, Sami 

2015 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

Gao, Feng; Arpiainen, Sanna; Puurunen, Riikka L. 

2015 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

Liu, Xuwen; Haimi, Eero; Hannula, Simo-Pekka; Ylivaara, Oili M. E.; Puurunen, Riikka L. 

2014 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Putkonen, Matti; Bosund, M.; Ylivaara, Oili M. E.; Puurunen, Riikka; Kilpi, L.; Ronkainen, H.; Sintonen, S.; Ali, S.; Lipsanen, H.; Liu, Xuwen; Haimi, Eero; Hannula, Simo-Pekka; Sajavaara, T.; Buchanan, I.; Karwacki, E.; Vähä-Nissi, M. 

2014 

THIN SOLID FILMS 

Elsevier Science 

ISSN: 0040-6090 

X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

Sintonen, Sakari; Ali, Saima; Ylivaara, Oili M. E.; Puurunen, Riikka L.; Lipsanen, Harri 

2014 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Ylivaara, Oili M. E.; Liu, Xuwen; Kilpi, L.; Lyytinen, Jussi; Schneider, D.; Laitinen, M.; Julin, J.; Ali, S.; Sintonen, S.; Berdova, Maria; Haimi, Eero; Sajavaara, T.; Ronkainen, H.; Lipsanen, H.; Koskinen, Jari; Hannula, Simo-Pekka; Puurunen, R.L. 

2014 

THIN SOLID FILMS 

Elsevier Science 

ISSN: 0040-6090 

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

Puurunen, R. L.; Häärä, A.; Saloniemi, H.; Dekker, J.; Kainlauri, M.; Pohjonen, H.; Suni, T.; Kiihamäki, J.; Santala, E.; Leskelä, M.; Kattelus, H. 

2012 

SENSORS AND ACTUATORS A: PHYSICAL 

Elsevier 

ISSN: 0924-4247 

Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

Puurunen, R. L.; Suni, T.; Ylivaara, O. M E; Kondo, H.; Ammar, M.; Ishida, T.; Fujita, H.; Bosseboeuf, A.; Zaima, S.; Kattelus, H. 

2012 

SENSORS AND ACTUATORS A: PHYSICAL 

Elsevier 

ISSN: 0924-4247 

Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

Laitinen, M.; Sajavaara, T.; Rossi, M.; Julin, J.; Puurunen, R. L.; Suni, T.; Ishida, T.; Fujita, H.; Arstila, K.; Brijs, B.; Whitlow, H. J. 

2011 

NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS 

Elsevier Science B.V. 

ISSN: 0168-583X 

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

Puurunen, Riikka L.; Sajavaara, Timo; Santala, Eero; Miikkulainen, Ville; Saukkonen, Tapio; Laitinen, Mikko; Leskelä, Markku 

2011 

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 

AMER SCIENTIFIC PUBLISHERS 

ISSN: 1533-4880 

Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

Laamanen, M.; Blomberg, M.; Puurunen, R. L.; Miranto, A.; Kattelus, H. 

2010 

SENSORS AND ACTUATORS A: PHYSICAL 

Elsevier 

ISSN: 0924-4247 

Atomic layer deposition of iridium(III) acetylacetonate on alumina, silica-alumina, and silica supports

Silvennoinen, Riitta; Jylhä, Olli; Lindblad, Marina; Sainio, Jani; Puurunen, Riikka; Krause, Outi 

2007 

APPLIED SURFACE SCIENCE 

Elsevier Science B.V. 

ISSN: 0169-4332 

Inductively coupled plasma etching of amorphous Al2O3 and TiO2 mask layers grown by atomic layer deposition

Dekker, J.; Kolari, K.; Puurunen, R. L. 

2006 

Journal of Vacuum Science and Technology. Part B. 

AMER INST PHYSICS 

ISSN: 1071-1023 

Nucleation of atomic-layer-deposited HfO 2 films, and evolution of their microstructure, studied by grazing incidence small angle x-ray scattering using synchrotron radiation

Green, M. L.; Allen, A. J.; Li, X.; Wang, J.; Ilavsky, J.; Delabie, A.; Puurunen, R. L.; Brijs, B. 

2006 

APPLIED PHYSICS LETTERS 

AMER INST PHYSICS 

ISSN: 0003-6951 

Atomic layer deposition of hafnium oxide on germanium substrates

Delabie, Annelies; Puurunen, Riikka L.; Brijs, Bert; Caymax, Matty; Conard, Thierry; Onsia, Bart; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Heyns, Marc M.; Meuris, Marc; Viitanen, Minna M.; Brongersma, Hidde H.; De Ridder, Marco; Goncharova, Lyudmila V.; Garfunkel, Eric; Gustafsson, Torgny; Tsai, Wilman 

2005 

JOURNAL OF APPLIED PHYSICS 

AIP Publishing 

ISSN: 0021-8979 

Grazing incidence-X-ray fluorescence spectrometry for the compositional analysis of nanometer-thin high-κ dielectric HfO2 layers

Hellin, David; Delabie, Annelies; Puurunen, Riikka L.; Beaven, Peter; Conard, Thierry; Brijs, Bert; De Gendt, Stefan; Vinckier, Chris 

2005 

ANALYTICAL SCIENCES 

Japan Society for Analytical Chemistry 

ISSN: 0910-6340 

The future of high-K on pure germanium and its importance for Ge CMOS

Meuris, M.; Delabie, A.; Van Elshocht, S.; Kubicek, S.; Verheyen, P.; De Jaeger, B.; Van Steenbergen, J.; Winderickx, G.; Van Moorhem, E.; Puurunen, R. L.; Brijs, B.; Caymax, M.; Conard, T.; Richard, O.; Vandervorst, W.; Zhao, C.; De Gendt, S.; Schram, T.; Chiarella, T.; Onsia, B.; Teerlinck, I.; Houssa, M.; Mertens, P. W.; Raskin, G.; Mijlemans, P.; Biesemans, S.; Heyns, M. M. 

2005 

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 

Elsevier Limited 

ISSN: 1369-8001 

Erratum Random deposition as a growth mode in atomic layer deposition (Chemical Vapor Deposition (2004) 10 (159))

Puurunen, Riikka L. 

2005 

CHEMICAL VAPOR DEPOSITION 

Wiley-VCH Verlag 

ISSN: 0948-1907 

Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications Analysis of the density of nanometer-thin films

Puurunen, Riikka L.; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Green, Martin L.; Brijs, Bert; Richard, Olivier; Bender, Hugo; Conard, Thierry; Hoflijk, Ilse; Vandervorst, Wilfried; Hellin, David; Vanhaeren, Danielle; Zhao, Chao; De Gendt, Stefan; Heyns, Marc 

2005 

APPLIED PHYSICS LETTERS 

AMER INST PHYSICS 

ISSN: 0003-6951 

Reply to "Comment on 'Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water' " [J. Appl. Phys. 95, 477 (2204)]

Puurunen, Riikka L. 

2005 

JOURNAL OF APPLIED PHYSICS 

AIP Publishing 

ISSN: 0021-8979 

Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water

Puurunen, Riikka L. 

2005 

APPLIED SURFACE SCIENCE 

Elsevier Science B.V. 

ISSN: 0169-4332 

Surface chemistry of atomic layer deposition A case study for the trimethylaluminum/water process

Puurunen, Riikka L. 

2005 

JOURNAL OF APPLIED PHYSICS 

AIP Publishing 

ISSN: 0021-8979 

Random deposition as a growth mode in atomic layer deposition

Puurunen, Riikka L. 

2004 

CHEMICAL VAPOR DEPOSITION 

Wiley-VCH Verlag 

ISSN: 0948-1907 

Island growth as a growth mode in atomic layer deposition A phenomenological model

Puurunen, Riikka L.; Vandervorst, Wilfried 

2004 

JOURNAL OF APPLIED PHYSICS 

AIP Publishing 

ISSN: 0021-8979 

Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water

Puurunen, Riikka L. 

2004 

JOURNAL OF APPLIED PHYSICS 

AIP Publishing 

ISSN: 0021-8979 

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon Growth mode modeling and transmission electron microscopy

Puurunen, Riikka L.; Vandervorst, Wilfried; Besling, Wim F A; Richard, Olivier; Bender, Hugo; Conard, Thierry; Zhao, Chao; Delabie, Annelies; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Viitanen, Minna M.; De Ridder, Marco; Brongersma, Hidde H.; Tamminga, Yde; Dao, Thuy; De Win, Toon; Verheijen, Marcel; Kaiser, Monja; Tuominen, Marko 

2004 

JOURNAL OF APPLIED PHYSICS 

AIP Publishing 

ISSN: 0021-8979 

Growth Per Cycle in Atomic Layer Deposition: A Theoretical Model

Puurunen, Riikka 

2003 

CHEMICAL VAPOR DEPOSITION 

Wiley-VCH Verlag 

Chromium(III) supported on aluminum-nitride-surfaced alumina: characteristics and dehydrogenation activity

Puurunen, Riikka; Airaksinen, Sanna; Krause, Outi 

2003 

JOURNAL OF CATALYSIS 

Academic Press Inc. 

ISSN: 0021-9517 

Growth Per Cycle in Atomic Layer Deposition: Real Application Examples of a Theoretical Model

Puurunen, Riikka 

2003 

CHEMICAL VAPOR DEPOSITION 

Wiley-VCH Verlag 

Spectroscopic Study on the Irreversible Deactivation of Chromia/Alumina Dehydrogenation Catalysts

Puurunen, Riikka; Weckhuysen, Bert 

2002 

JOURNAL OF CATALYSIS 

Academic Press Inc. 

ISSN: 0021-9517 

Growth of Aluminum Nitride on Porous Alumina and Silica through Separate Saturated Gas-Solid Reactions of Trimethylaluminum and Ammonia

Puurunen, Riikka; Root, Andrew; Sarv, Priit; Viitanen, Minna; Brongersma, Hidde; Lindblad, Marina; Krause, Outi 

2002 

CHEMISTRY OF MATERIALS 

American Chemical Society ACS 

Preparation of silica-supported cobalt catalysts through chemisorption of cobalt(II) and cobalt(III) acetylacetonate

Rautiainen, Aimo; Lindblad, Marina; Backman, Leif; Puurunen, Riikka 

2002 

Physical Chemistry Chemical Physics 

The Royal Society of Chemistry 

Successive reactions of gaseous trimethylaluminium and ammonia on porous alumina

Puurunen, Riikka L.; Lindblad, Marina; Root, Andrew; Krause, A.Outi I. 

2001 

Physical Chemistry Chemical Physics 

The Royal Society of Chemistry 

Monitoring chromia/alumina catalysts in situ during propane dehydrogenation by optical fiber UV-visible diffuse reflectance spectroscopy

Puurunen, Riikka L.; Beheydt, Bram G.; Weckhuysen, Bert M. 

2001 

JOURNAL OF CATALYSIS 

Academic Press Inc. 

ISSN: 0021-9517 

Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition

Puurunen, R.L.; Root, A.; Sarv, P.; Haukka, S.; Iiskola, E.I.; Lindblad, M.; Krause, A.O.I. 

2000 

APPLIED SURFACE SCIENCE 

Elsevier Science B.V. 

ISSN: 0169-4332 

IR and NMR Study of the Chemisorption of Ammonia on Trimethylaluminium-Modified Silica

Puurunen, R.L.; Root, A.; Haukka, S.; Iiskola, E.; Lindblad, M.; Krause, A.O.I. 

2000 

Journal of Physical Chemistry B 

AMER CHEMICAL SOC 

ISSN: 1520-6106 

Katsausartikkeli tieteellisessä aikakauslehdessä

Review Article Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David C.; Chen, Rong; Chubarov, Mikhail; Cremers, Veronique; Devi, Anjana; Drozd, Viktor; Elnikova, Liliya; Gottardi, Gloria; Grigoras, Kestutis; Hausmann, Dennis M.; Hwang, Cheol Seong; Jen, Shih Hui; Kallio, Tanja; Kanervo, Jaana; Khmelnitskiy, Ivan; Kim, Do Han; Klibanov, Lev; Koshtyal, Yury; Krause, A. Outi I.; Kuhs, Jakob; Kärkkänen, Irina; Kääriäinen, Marja Leena; Kääriäinen, Tommi; Lamagna, Luca; Łapicki, Adam A.; Leskelä, Markku; Lipsanen, Harri; Lyytinen, Jussi; Malkov, Anatoly; Malygin, Anatoly; Mennad, Abdelkader; Militzer, Christian; Molarius, Jyrki; Norek, Małgorzata; Özgit-Akgün, Çaǧla; Panov, Mikhail; Pedersen, Henrik; Piallat, Fabien; Popov, Georgi; Puurunen, Riikka L.; Rampelberg, Geert; Ras, Robin H A; Rauwel, Erwan; Roozeboom, Fred; Sajavaara, Timo; Salami, Hossein; Savin, Hele; Schneider, Nathanaelle; Seidel, Thomas E.; Sundqvist, Jonas; Suyatin, Dmitry B.; Törndahl, Tobias; Van Ommen, J. Ruud; Wiemer, Claudia; Ylivaara, Oili M E; Yurkevich, Oksana 

2017 

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A 

AVS Science and Technology Society 

ISSN: 0734-2101 

A short history of atomic layer deposition Tuomo Suntola's atomic layer epitaxy

Puurunen, Riikka L. 

2014 

CHEMICAL VAPOR DEPOSITION 

Wiley-VCH Verlag 

ISSN: 0948-1907 

Crystallinity of inorganic films grown by atomic layer deposition Overview and general trends

Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko; Puurunen, Riikka L. 

2013 

JOURNAL OF APPLIED PHYSICS 

AIP Publishing 

ISSN: 0021-8979 

Formation of metal oxide particles in atomic layer deposition during the chemisorption of metal chlorides A review

Puurunen, Riikka L. 

2005 

CHEMICAL VAPOR DEPOSITION 

Wiley-VCH Verlag 

ISSN: 0948-1907 

Kirjan tai muun kokoomateoksen osa

Low-temperature processes for MEMS device fabrication

Kiihamäki, Jyrki; Kattelus, Hannu; Blomberg, Martti; Puurunen, Riikka; Laamanen, Mari; Pekko, Panu; Saarilahti, Jaakko; Ritala, Heini; Rissanen, Anna 

2010 

NATO Science for Peace and Security Series B: Physics and Biophysics 

ISBN: 9789048138050 

ISSN: 1874-6500 

Atomic Layer Deposition in MEMS Technology

Puurunen, Riikka L.; Kattelus, Hannu; Suntola, Tuomo 

2010 

Elsevier Inc. 

ISBN: 9780815515944 

Artikkeli konferenssijulkaisussa

Influence of ALD temperature on thin film conformality Investigation with microscopic lateral high-aspect-ratio structures

Puurunen, Riikka L.; Gao, Feng 

2017 

Institute of Electrical and Electronics Engineers Inc. 

ISBN: 9781509034161 

Use of ALD thin film bragg mirror stacks in tuneable visible light mems fabry-perot interferometers

Rissanen, Anna; Puurunen, Riikka L. 

2012 

ISBN: 9780819488923 

Direct wafer bonding of atomic layer deposited TiO2 and Al 2O3 thin films

Puurunen, R. L.; Suni, T.; Ylivaara, O.; Kondo, H.; Ammar, M.; Ishida, T.; Fujita, H.; Bosseboeuf, A.; Zaima, S.; Kattelus, H. 

2011 

ISBN: 9781457701573 

Vapor-phase self-assembled monolayers for improved MEMS reliability

Rissanen, Anna; Tappura, Kirsi; Laamanen, Mari; Puurunen, Riikka; Färm, Elina; Ritala, Mikko; Leskelä, Markku 

2010 

ISBN: 9781424481682 

Bonding of ALD alumina for advanced SOI substrates

Suni, Tommi; Puurunen, Riikka L.; Ylivaara, Oili; Kattelus, Hannu; Henttinen, Kimmo; Ishida, Tadashi; Fujita, Hiroyuki 

2010 

ISBN: 9781566778237 

Implementing ALD layers in MEMS processing

Puurunen, R. L.; Saarilahti, J.; Kattelus, H. 

2007 

ISBN: 9781566775731 

Surface preparation techniques for high-k deposition on Ge substrates

Van Elshocht, Sven; Delabie, Annelies; Brijs, Bert; Caymax, Matty; Conard, Thierry; Onsia, Bart; Puurunen, Riikka; Richard, Olivier; Van Steenbergen, Jan; Zhao, Chao; Meuris, Marc; Heyns, Marc M. 

2005 

Solid State Phenomena 

Trans Tech Publications Ltd. 

ISBN: 390845106X 

ISSN: 1012-0394 

Implementation of high-k gate dielectrics - A status update

De Gendt, S.; Chen, J.; Carter, R.; Cartier, E.; Caymax, M.; Claes, M.; Conard, T.; Delabie, A.; Deweerd, W.; Kaushik, V.; Kerber, A.; Kubicek, S.; Maes, J. W.; Niwa, M.; Pantisano, L.; Puurunen, R.; Ragnarsson, L.; Schram, T.; Shimamoto, Y.; Tsai, W.; Rohr, E.; Van Elshocht, S.; Witters, T.; Young, E.; Zhao, C.; Heyns, M. 

2003 

Institute of Electrical and Electronics Engineers Inc. 

ISBN: 4891140372 

Scaling of Hf-based gate dielectrics - Integration with polysilicon gates

De Gendt, S.; Caymax, M.; Chen, J.; Claes, M.; Conard, T.; Delabie, A.; Deweerd, W.; Kaushik, V.; Kerber, A.; Kubicek, S.; Niwa, M.; Pantisano, L.; Puurunen, R.; Ragnarsson, L.; Schram, T.; Shimamoto, Y.; Tsai, W.; Rohr, E.; Van Elshocht, S.; Vandervorst, W.; Witters, T.; Young, E.; Zhao, C.; Heyns, M. 

2003 

ELECTROCHEMICAL SOCIETY 

ISBN: 1566774055 

Erratum Growth per cycle in atomic layer deposition: A theoretical model (Chemical Vapor Deposition (2003) 9 (249))

Puurunen, Riikka L. 

2004 

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