Riikka Puurunen

Photographer: Erkki Pöytäniemi

PuurunenAalto University

Riikka Puurunen

Professori (Associate professor), Department of Chemical and Metallurgical Engineering

What do you do?

What do you do?

Associate professor (tenure track), Catalysis Science and Technology. Strong background and continued interest in Atomic Layer Deposition (ALD); aiming to build research e.g. with microreactors and in situ/operando measurements. "Work-hobby:" history of ALD; interested in open science approaches. Feb-Jul 2017 working 60% at Aalto University and 40% at VTT Technical Reseach Centre of Finland; from Aug 2017 on, full time at Aalto University. Open for new (and old!) collaborations. 


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Contact information

Work street address
Kemistintie 1
02150
Espoo
Finland
Work postal address
P.O. Box 16100
00076
AALTO
Finland
Room number
E412
Work email
riikka.puurunen at aalto.fi
Twitter
http://twitter.com/@rlpuu

Publications

Peer-reviewed scientific articles

Journal article-refereed, Original research

Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

 

2016 

Langmuir 

http://dx.doi.org/10.1021/acs.langmuir.6b03007 

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

 

2015 

J. Vac. Sci. Technol. A 

http://dx.doi.org/10.1116/1.4903941 

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

 

2014 

Thin Solid Films 

http://dx.doi.org/10.1016/j.tsf.2013.11.112 

Chromium(III) acetylacetonate supported on aluminium-nitride-surfaced alumina: characteristics and dehydrogenation activity

 

2003 

J. Catal. 

http://dx.doi.org/10.1016/S0021-9517(02)00016-7 

Spectroscopic study on the irreversible deactivation of chromia/alumina dehydrogenation catalysts

 

2002 

J. Catal.  

http://dx.doi.org/10.1006/jcat.2002.3686 

Review article, Literature review, Systematic review

Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD"

 

2016 

J. Vac. Sci. Technol. A 

http://dx.doi.org/10.1116/1.4971389 

A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy

 

2014 

Chem. Vap. Deposition 

http://dx.doi.org/10.1002/cvde.201402012 

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

 

2013 

J. Appl. Phys. 

http://dx.doi.org/10.1063/1.4757907 

Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process

 

2005 

J. Appl. Phys. 

http://dx.doi.org/10.1063/1.1940727 

On other Aalto web sites

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